Products
Nines are offering a range of processing tools with the patented ADE (Atmospheric Dry Etch) technology at the core.This technology offers a range of benefits to the cell manufacturer and an efficient texturing method for diamond wire cut multi-crystalline mc-Si wafers.
BENEFITS - UNIVERSAL, FUTURE PROOF TEXTURING TECHNOLOGY
- UNIVERSAL texturing solution: Enables the use of diamond wire cut wafers, epitaxial wafers, cast wafers, mono and multi crystalline
- Delivers low reflectivity textures, outperforming industry standards with wafer surface reflectivity Rw values adjustable within a range from 19% down to 2% (black silicon)
- True Single side processing - the back side is untouched
- Enables advanced cell architecture whilst also reducing processing costs
- Facilitates scalability of the manufacturing process – inline, high throughput, On-Site generation of Etching gases
- Improves the overall sustainability of the manufacturing process, using only Zero Global Warming otential (GWP) Chemicals.
Fully automated 1000 w/h ADE texturing pilote line - Nines PV, Dublin, Ireland
PROCESS TOOLS
The first tool that was launched on the market is the 9sADE100 which is aimed at the R&D/Pilot Production line market. The 9sADE100 introduces our customers to the ADE Process and to the flexibility it offers in developing new cell architectures & process flows. With its compact footprint the ADE100 has been designed to be installed in lab environments and uses a low concentration of etching gas, delivered from high pressure bottles. Alternatively this base level, single reactor tool can be modified and upgraded for industrial installation using On-Site generation for the etching gas, delivering output of 30MW.
The second tool on our roadmap is a 200MW offering; the 9sADE6000. This product is aimed at Industrial Cell manufacturers for capacity production. The ADE6000 is a Multi-reactor version of the 9sADE100, meaning that new processes developed on the ADE100 can be easily transferred to the ADE6000 with Zero process change risk.
