Latest News

28/03/22 SiliconPV conference 2022

NINES PV will attend the 12th International conference on Crystalline Silicon Photovoltaics in Konstanz, Germany.


28/03/22 ADE for TOPCON cells

Latest TOPCON cell results from Fraunhofer ISE, using ADE for poly-Si wrap around removal


25/03/21 SiPV 2021 + nPV Workshop - conference

We will be attending the online SiPV + nPV Workshop conference, hosted by the Institute for Solar Energy Research Hamelin (ISFH) from the 19-23 of April 2021.


More news...

> INDUSTRIAL DRY ETCHING OF SILICON

Nines PV presents the ADE© technology: a unique, low cost, chemical DRY ETCHING of silicon production technology for the PV solar cell manufacturing industry.

ADE is a novel, proprietary technology patented by NINES PV. Unlike RIE (Reactive Ion Etching), ADE does not require any high cost vacuum pumps or plasma modules, and is purely a chemical etch process (no ions). 

EUROPEAN INNOVATION FOR SOLAR CELL MANUFACTURING

ADE can scale to multi-GW levels, resulting in very low cost of ownership. It is currently the only viable industrial dry etching process available for the photovoltaic market.

SINGLE SIDE ETCHING 

Our single side etching process enables advanced cell architectures (TOPCON, HTJ, PERL, PEROVSKYTE...), through for exemple the removing of poly-silicon wrap around, the selective etching and patterning or edge isolation of solar cells.

SINGLE SIDE NANO-TEXTURING

Our advanced single side nano-texturing process fully leverages the cost savings of diamond-wire cut multicristallyne wafers and novel kerfless wafer technologies. It is now being developped to provide a roadmap for high efficiency monocrystalline cells, enabling a path toward lower front surface reflectance, leaner process flow and lower ligth angle dependance.

LOW ENVIRONMENTAL IMPACT -WATER, GREEN HOUSE GAS

ADE allows manufacturers to start moving away from the traditionnal wet etching methods that have a large environmental and tool footprint. Our dry etch tools provide superior efficiencies, etch rate and tighter process control in a very small package. The etching gas used in the process is not a Green house gas (GHG), has no global warming potential.

 SNEC, Shanghai            World Conference on PV Energy Conversion, 26 – 30 September 2022 in the Milano Convention Centre in Milan, Italy.

SNEC                               

> FIND OUT MORE ABOUT OUR OFFERINGS & APPLICATIONS

Our silicon etching process is suitable for ANY type of Si WAFER or layer, using the same chemistry, without the use of any global warming gases, nor any water ! This is a FUTURE-PROOF solution... Thinking about your technology roadmap ? ADE allows to switch to any type of silicon wafer and provide a range of advanced processes  including textures (lower reflectivity / higher current) down to nano-textures and black silicon levels, as well as a very selective single side etching and edge isolation, opening a whole new range of possibilities. Also compatible with thin wafers, as low as 100um; and roll to roll process, fluorination of films is also possible.

 Follow us on LinkedIn     ResearchGate for our scientific publications

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A novel silicon wafer etching technology designed for your advanced industrial manufacturing requirements.

Dry Etching tools engineered to meet the needs of the Terra Watt age - enabling high volume & low cost production.

Check out our latest TOPCON application for poly-Si removal.

Nines PV is an equipment manufacturer for the solar industry. The company is headquartered in Dublin, Ireland.